Described is an equipment consisting of several systems as follows : an ion system having a sputtering ion source and an asymmetric three electrode acceleration tube operated at 50 keV with a beam current up to 4 mA ( for N + );

本设备由以下系统组成：注入系统，有溅射离子源及不对称 三 电极加速 管，能量50keV，流强4mA（N~+）；