Tantalum Silicide Formation by Ion-Beam Mixing and Rapid Thermal Annealing

用离子束混合及快速热处理方法形成 钽 的 硅化 物

Reactive Ion Etching of Silicon and Tantalum Silicide for Submicron Structures

硅及 硅化 钽 超 精细结构的刻蚀