Research of influence of surface passivation on catastrophic optical damage

表面 钝化 技术对光学灾变的影响的研究

The optimization of RIE parameters for Ni mask PMMA etching is studied . The CHF 3 gas of the surface passivation effect is added in the O 2 etching gas to obtain the vertical side wall and minimal mask undercut at a fast etching rate .

研究目的是优化Ni掩模PMMARIE的刻蚀参数，在氧刻蚀气体中加入 表面 钝化性气体CHF3，以较快的刻蚀速率获得垂直的侧壁和最小的掩模钻蚀。

The paper analyzes generation mechanism of corrosion acoustic emission signals and influence factors such as metal surface passivation film rupture and chemical reaction process of metal ions .

腐蚀声发射信号可分为 突 发型和连续型，对腐蚀声发射信号产生的机理和影响其产生的因素，如金属 表面 钝化膜的破裂、金属离子化学反应过程进行了分析。

Study on Surface Passivation and Resistance to Environmental Corrosion of Brass

黄铜 表面 钝化 处理与耐环境腐蚀研究

Device Processing : Etching . Surface passivation ; dielectric films .

元件制程：蚀刻， 表面 钝化，介电材料薄膜。

This paPer gives a description of the semiconductor surface Passivation set ( Model BD-101 ) .

本文主要是介绍BD-101型半导体 表面 钝化台。

A new method of surface passivation for mercury cadmium telluride

碲镉汞 表面 钝化新方法

Theoretical Simulation of Electronic Structure and Optical-electronic Property of FeS_2 and Its Surface Passivation

FeS2的电子结构与光电性能理论模拟及其 表面 钝化 工艺 研究

Effects of Surface Passivation on Reliability of Ge MOS Capacitors

表面 钝化对GeMOS电容可靠性的影响

The importance of surface passivation and quantum confinement in the visible emissions has been discussed .

就 表面 钝化和量子限制对可见光辐射的重要性作了讨论。

Therefore it is of great importance to develop process technology for surface passivation .

因此，发展 表面 钝化技术工作是很重要的。

The surface modification methods for preventing silver products from tarnishing were summarized such as surface passivation surface plating and surface coating .

概述了防止银产品变色的表面改性方法： 表面 钝化、表面镀膜和表面涂膜，并着重介绍了表面涂膜法。

Surface Passivation Process with Polyimide

聚酰亚胺 表面 钝化工艺

The influence of encapsulation and surface passivation on the reflection curves is discussed and theoretical reflection curves have verified the experimental results .

分析了电池封装和 电池 表面 钝化对反射曲线的影响，并验证了实验结果。

Study on surface passivation films for integrated circuits

半导体集成电路用 表面 钝化膜的研究

The influences of surface passivation of photoluminescence and electroluminescence properties of porous silicon have been presented .

报道多孔硅的 表面 钝化对其光致发光和电致发光的影响。

The surface passivation of GaAs is an unsolved problem for a long time .

砷化镓的 表面 钝化是一个长期未能很好解决的问题。

The experiment results show that the Schottky barrier properties and the surface passivation actions to silicon devices of the films are good .

实验表明该膜有良好的肖特基势垒特性和对硅器件的 表面 钝化作用。

Investigate the high laser damage threshold cavity surface processing technology including vacuum cleavage cavity surface passivation high damage threshold coating . To suppress the cavity surface oxidation reduce the density of surface state decrease the radiative recombination in order to improve COD threshold .

探讨高激光损伤阈值腔面处理技术，包括真空解理、腔 面 钝化 处理、高损伤阈值腔面膜，以抑制腔面的氧化，降低腔面表面态密度，减少非辐射复合，提高器件的COD阂值。

Effect of surface passivation on the capability of SPS ti / ha bioactivity materials

表面 钝化 处理对SPSTi/HA生物材料性能的影响

Surface Passivation of Porous Silicon by Carbon Film

多孔硅的 表面碳膜 钝化

In the pioneer studies on silicon solar cells the solar cell surface passivation and antireflection are always the key subjects .

在晶硅太阳电池的研究中，太阳电池的 表面 钝化和减反射一直是太阳能先驱研究的主题。

Study of Backside Passivation in InSb Focal Plane Detector Device Processing : Etching . Surface passivation ; dielectric films .

InSb焦平面探测器背面钝化的研究元件制程：蚀刻， 表面 钝化，介电材料薄膜。

These methods including the ordered Si quantum dots with high density and small size the use of optical microcavity structure surface passivation technologies and doping of rare earth luminescent centers which are very important for the fabrication of high luminescent intensity Si quantum dots .

这些方法主要包括：采用高密度和小尺寸的有序Si量子点、光学微腔结构、 表面 钝化 处理技术和稀土发光中心掺杂。

As a new type of functional thin film material aluminum oxide film promises well as new type surface passivation of LED devices due to its high transmittance large refractive index good insulation strong anti-radiation excellent corrosion-resistance and high hardness an so on .

作为一种新型功能薄膜材料的氧化铝薄膜，由于具有透光率高、折射率大、绝缘性好、抗辐射能力强、耐蚀性强、硬度高等特点，有希望成为LED器件的新的 钝化 层 材料。

The main surface passivation methods for silicon solar cells at present were compared according to effective lifetime of minority carrier in Si wafers reflection losses and spectral response of silicon solar cells . The advantages and disadvantages of these surface passivation technologies are analysed and estimated .

通过对硅片的少数载流子有效寿命、硅太阳电池的反射损失和光谱响应这三个方面的研究，比较了目前主要的硅太阳电池 表面 钝化技术，对这些钝化技术的优缺点进行了分析和评价。

It is described that the innovatory technology of selective diffusion and study on surface passivation in theory for crystalline silicon solar cell .

本文的主要内容是介绍晶体硅太阳电池选择性扩散新工艺和 表面 钝化的理论研究。

The Realize of the Surface Passivation Technique by PECVD SiN

对PECVDSiN 表面 钝化工艺的体会

Silicon wafer surface passivation for solar cell

太阳电池用硅片 表面 钝化研究

It proves that the poly-silicon surface passivation is related to the compactness of SiNx film and the body passivation is mainly relate to the Hydrogen content of SiNx . 5 .

研究表明，多晶硅的 表面 钝化主要与氮化硅薄膜的致密性有关，而体钝化则主要与氮化硅中的氢含量有关。